The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2017
Filed:
Feb. 23, 2017
Fujifilm Corporation, Tokyo, JP;
Hiroki Takahashi, Saitama, JP;
Takeshi Iida, Sano, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
In the antireflection film, a hydrogenated carbon film as a first layer is formed on a surface of an optical substrate. A MgFfilm as a second layer having a lower refractive index than the first layer is formed on the first layer and functions as a low refractive index layer. The hydrogenated carbon film and the MgFfilm are formed using a RF magnetron sputtering equipment. During the formation of the hydrogenated carbon film, a mixed gas of argon and hydrogen is supplied to a vacuum chamber such that some of C—C bonds in the film are replaced with C—H bonds. Some of C—C bonds are cut by hydrogenation, and strains (stress) accumulating due to C—C bonds can be relaxed. As a result, the antireflection film which has excellent adhesiveness and is not broken is obtained.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile