The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 19, 2017

Filed:

Apr. 19, 2016
Applicant:

Pv Labs Inc., Ontario, CA;

Inventor:

Michael D. Lewis, Burlington, CA;

Assignee:

PV Labs Ltd., Hamilton, Ontario, CA;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F16M 13/00 (2006.01); F16M 13/02 (2006.01); G03B 17/56 (2006.01); B64D 47/08 (2006.01); F16F 15/00 (2006.01); F16M 11/10 (2006.01); F16M 11/12 (2006.01); F16M 11/18 (2006.01); F16M 11/20 (2006.01); F16F 15/04 (2006.01); F16M 11/04 (2006.01); H04N 5/232 (2006.01);
U.S. Cl.
CPC ...
F16M 13/02 (2013.01); B64D 47/08 (2013.01); F16F 15/00 (2013.01); F16F 15/04 (2013.01); F16M 11/043 (2013.01); F16M 11/10 (2013.01); F16M 11/12 (2013.01); F16M 11/121 (2013.01); F16M 11/123 (2013.01); F16M 11/18 (2013.01); F16M 11/2014 (2013.01); F16M 11/2035 (2013.01); F16M 11/2064 (2013.01); G03B 17/561 (2013.01); H04N 5/2328 (2013.01); G03B 2205/0007 (2013.01); H04N 5/23258 (2013.01);
Abstract

A platform stabilization system comprises a support frame, a platform and a plurality of isolators each extending directly between the support frame and the platform. Each isolator permits linear movement of the platform relative to the support frame with three degrees of freedom and permits rotational movement of the platform relative to the support frame with three degrees of freedom. The isolators cooperate to form an isolation array supporting the platform directly within, and spacing the platform from, the support frame. The isolation array permits limited linear movement of the platform within the support frame with three degrees of freedom and permits limited rotational movement of the platform relative to the support frame with three degrees of freedom. The isolation array is substantially more resistant to linear movement of the platform than to rotational movement of the platform and does not rotationally constrain the platform.


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