The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 19, 2017

Filed:

Feb. 20, 2013
Applicant:

Central Glass Company, Limited, Ube-shi, Yamaguchi, JP;

Inventors:

Chiharu Takimoto, Tsu, JP;

Toshihiro Hirano, Yokkaichi, JP;

Toru Ashida, Matsusaka, JP;

Nozomi Oonishi, Matsusaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 27/38 (2006.01); C09D 5/16 (2006.01); C09D 5/00 (2006.01); C08F 220/54 (2006.01); C09D 163/00 (2006.01); C08G 59/42 (2006.01); C03C 17/00 (2006.01); C03C 17/32 (2006.01); C03C 17/34 (2006.01); C03C 23/00 (2006.01); C09D 133/24 (2006.01); C08F 220/32 (2006.01);
U.S. Cl.
CPC ...
C09D 5/1662 (2013.01); C03C 17/007 (2013.01); C03C 17/326 (2013.01); C03C 17/34 (2013.01); C03C 23/007 (2013.01); C08F 220/54 (2013.01); C08G 59/4261 (2013.01); C09D 5/00 (2013.01); C09D 133/24 (2013.01); C09D 163/00 (2013.01); C08F 2220/325 (2013.01); Y10T 428/31511 (2015.04); Y10T 428/31515 (2015.04);
Abstract

Disclosed is an antifogging film-forming material obtained by reacting, in the presence of a quaternary ammonium salt or quaternary phosphonium salt, a copolymer represented by a certain general formula with a multifunctional epoxy compound having a solubility of 40-100 mass % in 25° C. water. The antifogging film-forming material is characterized by having a weight average molecular weight of 100,000-5,000,000. With this material, it becomes possible to obtain an antifogging article excellent in antifogging property, heat resistance, chemical resistance and abrasion resistance.


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