The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2017
Filed:
Sep. 11, 2014
Applicant:
Dic Corporation, Tokyo, JP;
Inventors:
Tomoyuki Imada, Ichihara, JP;
Yusuke Sato, Ichihara, JP;
Assignee:
DIC CORPORATION, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); C08G 8/28 (2006.01); C08G 8/36 (2006.01); C09D 161/14 (2006.01); C08L 61/14 (2006.01); G03F 7/075 (2006.01);
U.S. Cl.
CPC ...
C08G 8/28 (2013.01); C08G 8/36 (2013.01); C08L 61/14 (2013.01); C09D 161/14 (2013.01); G03F 7/039 (2013.01); G03F 7/0392 (2013.01); G03F 7/0758 (2013.01);
Abstract
Provided is a modified hydroxy naphthalene novolak resin which is optimal for a photosensitive composition and a resist material having high optical sensitivity, resolution, and alkali developability, and excellent heat resistance and moisture absorption resistance, and the modified hydroxy naphthalene novolak resin includes a structural moiety (I) represented by Structural Formula as a repeating unit: