The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 19, 2017

Filed:

Oct. 12, 2010
Applicants:

William Dick, Minneapolis, MN (US);

Francisco J. Romay, Vadnais Heights, MN (US);

Benjamin Y. H. Liu, North Oaks, MN (US);

Inventors:

William Dick, Minneapolis, MN (US);

Francisco J. Romay, Vadnais Heights, MN (US);

Benjamin Y. H. Liu, North Oaks, MN (US);

Assignee:

MSP CORPORATION, Shoreview, MN (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B03C 3/38 (2006.01);
U.S. Cl.
CPC ...
B03C 3/38 (2013.01);
Abstract

A method and apparatus are disclosed for exposing particles in a gas in order to cause the charge on the particles to change, the apparatus comprising a chamber having a conductive wall with a gas inlet and a gas outlet. An electrode with an exposed tip is in the chamber, the electrode being held at a different potential from the ground potential. The electrode is connected to a source of voltage sufficient to cause a corona discharge to occur forming ions in the chamber, and creating a region with a high electric field intensity and another region in which the electric field intensity is lower. The inlet and outlet define a gas flow path from the inlet to the outlet such that the gas flow path passes mainly through the region with the lower electric field intensity.


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