The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2017
Filed:
Feb. 12, 2015
Hitachi, Ltd., Tokyo, JP;
Hideaki Nishiuchi, Tokyo, JP;
Futaro Ebina, Tokyo, JP;
Satoshi Totake, Tokyo, JP;
Takuya Nomura, Tokyo, JP;
Kunio Moriyama, Tokyo, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
When controlling the ejection of a charged particle beam from a synchrotron, a radiofrequency voltage is applied, which serves as the radio-frequency voltage to be applied to an ejection radio-frequency electrode equipping the synchrotron, and which is constituted by a first radio-frequency voltage for increasing an oscillation amplitude in such a way as to exceed a stable limit in order to eject to the exterior of the synchrotron a beam that circles inside the synchrotron, and a second radio-frequency voltage for preferentially ejecting a charged particle beam that circles in the vicinity of the stable limit, with the amplitude value of the second radiofrequency voltage being controlled in such a way that the amplitude value is 0 prior to the beam ejection start, the amplitude value increases gradually from the beam ejection start, and, once a predetermined amplitude value has been reached, this value is maintained.