The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 12, 2017

Filed:

Apr. 24, 2014
Applicant:

Champ Great Int'l Corporation, Eden Island, SC;

Inventor:

Florian Pschenitzka, San Francisco, CA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05F 1/02 (2006.01); H05K 1/02 (2006.01); G02B 1/16 (2015.01); G02B 1/10 (2015.01); H05K 1/09 (2006.01); B82Y 10/00 (2011.01);
U.S. Cl.
CPC ...
H05F 1/02 (2013.01); G02B 1/105 (2013.01); G02B 1/16 (2015.01); H05K 1/0259 (2013.01); B82Y 10/00 (2013.01); H05K 1/0234 (2013.01); H05K 1/0274 (2013.01); H05K 1/095 (2013.01); H05K 2201/0108 (2013.01); H05K 2201/0281 (2013.01); Y10T 29/49117 (2015.01);
Abstract

Optical stacks containing one or more patterned transparent conductor layers may be damaged by electrostatic discharges that occur during the optical stack manufacturing process. Such damage may result in non-conductive conductors within the patterned transparent conductor layer. An electrostatic discharge protected optical stack may include a substrate layer, a first anti-static layer having a sheet resistance of from about 10ohms per square (Ω/sq) to about 10Ω/sq, and a patterned transparent conductor layer. Methods of testing and assessing damage to patterned transparent conductors are provided.


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