The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 12, 2017

Filed:

May. 06, 2014
Applicant:

Dowa Holdings Co., Ltd., Tokyo, JP;

Inventors:

Koji Tanoue, Tokyo, JP;

Yoshiaki Aiki, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01M 10/0562 (2010.01); H01M 4/485 (2010.01); H01M 4/525 (2010.01); H01M 4/505 (2010.01); H01M 4/1391 (2010.01); H01M 4/62 (2006.01); H01M 4/04 (2006.01); C01B 25/45 (2006.01); H01M 4/36 (2006.01); H01M 10/0525 (2010.01); H01M 4/02 (2006.01); H01M 4/58 (2010.01);
U.S. Cl.
CPC ...
H01M 10/0562 (2013.01); C01B 25/45 (2013.01); H01M 4/0471 (2013.01); H01M 4/1391 (2013.01); H01M 4/485 (2013.01); H01M 4/505 (2013.01); H01M 4/525 (2013.01); H01M 4/62 (2013.01); H01M 4/366 (2013.01); H01M 4/5825 (2013.01); H01M 10/0525 (2013.01); H01M 2004/028 (2013.01); H01M 2300/0068 (2013.01); H01M 2300/0071 (2013.01);
Abstract

A positive electrode active material for a lithium ion secondary cell, in which the amount of a transition metal present in the vicinity of the outermost surface thereof is significantly decreased is provided. A solid electrolyte-coated positive electrode active material powder contains particles of a positive electrode active material for lithium ion secondary cell, containing a composite oxide of Li and a transition metal M, having on a surface thereof a coating layer of a solid electrolyte represented by LiAlTi(PO), wherein 0 £ X £ 0.5. An average proportion of a total atom number of Al, Ti and P in a total atom number of Al, Ti, M and P within an etching depth of 1 nm from the outermost surface determined by analysis in a depth direction with XPS is 50% or more. The transition metal M is, for example, at least one kind of Co, Ni and Mn.


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