The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 12, 2017

Filed:

Mar. 23, 2012
Applicant:

Wolfgang Reinert, Neumünster, DE;

Inventor:

Wolfgang Reinert, Neumünster, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J 5/08 (2006.01); H01L 31/0216 (2014.01); G01J 5/04 (2006.01); G01J 5/02 (2006.01); G01J 5/20 (2006.01); G02B 1/115 (2015.01); H01L 31/18 (2006.01);
U.S. Cl.
CPC ...
H01L 31/02165 (2013.01); G01J 5/024 (2013.01); G01J 5/0215 (2013.01); G01J 5/0235 (2013.01); G01J 5/045 (2013.01); G01J 5/046 (2013.01); G01J 5/0803 (2013.01); G01J 5/0806 (2013.01); G01J 5/0862 (2013.01); G01J 5/0875 (2013.01); G01J 5/20 (2013.01); G02B 1/115 (2013.01); H01L 31/18 (2013.01);
Abstract

The invention refers to an electromagnetic radiation sensor micro device for detecting electromagnetic radiation, which device comprises a substrate and a cover at least in part consisting of an electromagnetic radiation transparent material, and comprising a reflection reducing coating and providing a hermetic sealed cavity and an electromagnetic radiation detecting unit arranged within the cavity. The reflection reducing coating is arranged in form of a multi-layer thin film stack, which comprises a first layer and a second layer arranged one upon the other. The first layer has a first refractive index and the second layer has a second refractive index different from the one of said first layer. First and second layer are of such layer thickness that for a certain wavelength there is destructive interference. The invention also refers to a wafer element as well as method for manufacturing such a device.


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