The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 12, 2017

Filed:

May. 18, 2016
Applicant:

Infineon Technologies Ag, Neubiberg, DE;

Inventors:

Thorsten Meyer, Munich, DE;

Stefan Decker, Munich, DE;

Norbert Krischke, Munich, DE;

Christoph Kadow, Neuried, DE;

Assignee:

Infineon Technologies AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/148 (2006.01); H01L 29/768 (2006.01); H01L 29/10 (2006.01); H01L 21/265 (2006.01); H01L 21/266 (2006.01); H01L 21/8238 (2006.01); H01L 27/088 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); H01L 21/8234 (2006.01); H01L 29/423 (2006.01);
U.S. Cl.
CPC ...
H01L 29/105 (2013.01); H01L 21/266 (2013.01); H01L 21/26513 (2013.01); H01L 21/823412 (2013.01); H01L 21/823807 (2013.01); H01L 27/088 (2013.01); H01L 29/4236 (2013.01); H01L 29/66537 (2013.01); H01L 29/78 (2013.01);
Abstract

An integrated circuit having field effect transistors and manufacturing method. One embodiment provides an integrated circuit including a first FET and a second FET. At least one of source, drain, gate of the first FET is electrically connected to the corresponding one of source, drain, gate of the second FET. At least one further of source, drain, gate of the first FET and the corresponding one further of source, drain, gate of the second FET are connected to a circuit element, respectively. A dopant concentration of a body along a channel of each of the first and second FETs has a peak at a peak location within the channel.


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