The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2017
Filed:
May. 21, 2015
Shimadzu Corporation, Kyoto, JP;
Manabu Ueda, Kyotanabe, JP;
SHIMADZU CORPORATION, Kyoto-shi, Kyoto, JP;
Abstract
A dwell time calculation table () showing a correspondence relation between a CID gas pressure inside a collision cell () and a dwell time for data collection is stored in a processing condition parameter memory () of a controller (). In the table (), as the CID gas pressure becomes higher, the dwell time becomes longer. When an instruction to execute an MRM measurement mode is given, the controller () determines the dwell time in accordance with the currently set CID gas pressure, and controls a data collector () to accumulate detection signals from an ion detector () during the determined dwell time and obtain the accumulated value. If the CID gas pressure inside the collision cell () is high, a decrease in ion speed becomes remarkable, and the rising of the ion intensity becomes slow. However, if the dwell time becomes long, influences of the slow rising on the accumulated value are relatively reduced, and the accuracy of the accumulated value is enhanced. Accordingly, the quantitative accuracy can be enhanced.