The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 12, 2017

Filed:

Dec. 13, 2013
Applicants:

Jaydeep Sarkar, Thiells, NY (US);

Paul Gilman, Suffern, NY (US);

Inventors:

Jaydeep Sarkar, Thiells, NY (US);

Paul Gilman, Suffern, NY (US);

Assignee:

PRAXAIR S.T. TECHNOLOGY, INC., North Haven, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/00 (2006.01); H01J 37/34 (2006.01); C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3426 (2013.01); C23C 14/3407 (2013.01); H01J 37/34 (2013.01); H01J 37/3435 (2013.01); C23C 14/3414 (2013.01);
Abstract

The present invention relates to novel and improved high purity diffusion bonded copper (Cu) sputtering targets having a Cu purity level of 99.9999% (6N) or greater. The target assemblies of the present invention exhibit sufficient bond strength and microstructural homogeneity, both of which are properties previously considered mutually exclusive for conventional 6N Cu target assemblies. The grain structure is characterized by an absence of alloying elements and the bonded interface is generally flat without any type of interlayer or interlocking arrangement.


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