The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 12, 2017

Filed:

Dec. 02, 2013
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Chang-Hyun Lee, Suwon-si, KR;

Jung-Dal Choi, Suwon-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/51 (2006.01); H01L 29/792 (2006.01); G11C 16/14 (2006.01); G11C 16/26 (2006.01); G11C 16/12 (2006.01); H01L 21/28 (2006.01); H01L 27/115 (2017.01); H01L 27/11521 (2017.01); H01L 27/11524 (2017.01); H01L 27/11526 (2017.01); H01L 27/11529 (2017.01); H01L 29/423 (2006.01); H01L 29/778 (2006.01);
U.S. Cl.
CPC ...
G11C 16/12 (2013.01); G11C 16/14 (2013.01); G11C 16/26 (2013.01); H01L 21/28273 (2013.01); H01L 27/115 (2013.01); H01L 27/11521 (2013.01); H01L 27/11524 (2013.01); H01L 27/11526 (2013.01); H01L 27/11529 (2013.01); H01L 29/42332 (2013.01); H01L 29/513 (2013.01); H01L 29/7782 (2013.01); H01L 29/792 (2013.01); H01L 29/7923 (2013.01);
Abstract

A non-volatile memory device includes a semiconductor substrate and a tunnel insulating layer and a gate electrode. A multiple tunnel insulation layer with a plurality of layers, a charge storage insulation layer, and a multiple blocking insulation layer with layers are sequentially stacked between the gate electrode and the tunnel insulating layer. A first diffusion region and a second diffusion region in the semiconductor substrate are adjacent to opposite respective sides of the gate electrode. When a voltage is applied to the gate electrode and the semiconductor substrate to form a voltage level difference therebetween, a minimum field in the tunnel insulation layer is stronger than in the blocking insulation layer. A minimum field at a blocking insulation layer can be stronger than at a tunnel insulation layer, and the migration probability of charges through the tunnel insulation layer can be higher than through the blocking insulation layer.


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