The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2017
Filed:
Mar. 12, 2014
Honeywell International Inc., Morris Plains, NJ (US);
Hao Bai, Beijing, CN;
Henry Chen, Beijing, CN;
Paul Derby, Lubbock, TX (US);
Hari Thiruvengada, Plymouth, MN (US);
Honeywell International Inc., Morris Plains, NJ (US);
Abstract
Apparatus and associated methods relate to determining a fit-quality metric for a mask/face combination based upon a calculated dead-space volume between a virtual mask and a virtual face virtually aligned so as to create an integrity seal circumscribing a mouth and nose region. In an illustrative embodiment, an interactive virtual fitting system may receive a three-dimensional (3D) virtual face associated with a person. The system may retrieve 3D models of various respirators selected by user determined criteria. The system may then compute a fit-quality metric for each of the retrieved 3D models. The potential wearer may then be presented with the metrics for review. The potential wearer may select a respirator based upon these computed metrics. A virtual fitting of many respirators may advantageously reduce the time needed for selecting a properly fitting respirator while simultaneously ensuring that the selected respirator may be comfortable and well fitting.