The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 12, 2017

Filed:

Jun. 30, 2014
Applicants:

Boe Technology Group Co., Ltd., Beijing, CN;

Chengdu Boe Optoelectronics Technology Co., Ltd., Chengdu, Sichuan, CN;

Inventors:

Zerong Yang, Beijing, CN;

Qingde Long, Beijing, CN;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/20 (2006.01); G03F 7/00 (2006.01); G03F 7/20 (2006.01); G02F 1/1335 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0007 (2013.01); G02B 5/201 (2013.01); G02F 1/133516 (2013.01); G03F 7/2024 (2013.01); G03F 7/2032 (2013.01);
Abstract

A manufacturing method of a color filter substrate includes: depositing a photoresist layer on a substrate, patterning the photoresist layer through exposure and development and executing an UV curing; or forming an overcoat whose material is a light-cured material on a substrate, conducting an UV irradiation on the substrate from front and back sides of the substrate, respectively; or, depositing a black matrix photoresist, a red photoresist, a green photoresist and a blue photoresist on a substrate, respectively, and forming corresponding patterns respectively through exposure and development and executing an UV curing. By the technical solution, the line-width of a BM can be restrained from broadening, and the curing time can be shortened, thereby raising the production efficiency.


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