The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2017
Filed:
Dec. 15, 2014
Applicant:
Cypress Semiconductor Corporation, San Jose, CA (US);
Inventors:
Chuan Lin, Sunnyvale, CA (US);
Dong-Hyuk Ju, Cupertino, CA (US);
Imran Khan, Perrysburg, OH (US);
Jun Kang, San Jose, CA (US);
Shibly S. Ahmed, San Jose, CA (US);
Assignee:
Cypress Semiconductor Corporation, San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R 31/26 (2014.01); G01R 31/3187 (2006.01); H01L 21/66 (2006.01); G01R 31/27 (2006.01); G01R 31/28 (2006.01);
U.S. Cl.
CPC ...
G01R 31/27 (2013.01); G01R 31/2884 (2013.01); H01L 22/12 (2013.01);
Abstract
A method includes varying spacing between at least one of a source region or a drain region and a well contact region to create a group of configurations. The method further includes determining an effect of latchup on each configuration.