The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 12, 2017

Filed:

Jul. 26, 2012
Applicants:

Jun Phill Eom, Seoul, KR;

Dong Mug Seong, Seoul, KR;

Dong Hyun Lee, Seoul, KR;

Beom Sun Hong, Seoul, KR;

Yong IN Lee, Seoul, KR;

Inventors:

Jun Phill Eom, Seoul, KR;

Dong Mug Seong, Seoul, KR;

Dong Hyun Lee, Seoul, KR;

Beom Sun Hong, Seoul, KR;

Yong In Lee, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F21V 17/10 (2006.01); F21S 8/02 (2006.01); F21V 5/00 (2015.01); F21V 5/04 (2006.01); F21V 15/01 (2006.01); G02B 3/00 (2006.01); F21Y 105/10 (2016.01); F21Y 115/10 (2016.01);
U.S. Cl.
CPC ...
F21V 17/101 (2013.01); F21S 8/02 (2013.01); F21V 5/008 (2013.01); F21V 5/004 (2013.01); F21V 5/04 (2013.01); F21V 15/01 (2013.01); F21Y 2105/10 (2016.08); F21Y 2115/10 (2016.08); G02B 3/0056 (2013.01);
Abstract

Disclosed is a lighting device capable of reducing UGR (Unified Glare Rating). in a illuminating member, reflection efficiency of light significantly scattering to the left and right among light applied to the air gap through the diffusion plate is increased using the adhesion material pattern layer of periphery surrounding an air gap, and simultaneously, the UGR may be reduced by removing the process disposing the pattern with a specific structure and increasing the process efficiency.


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