The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 12, 2017

Filed:

Nov. 30, 2011
Applicants:

Thomas Deppisch, Aschaffenburg, DE;

Franz-josef Helle, Rodenbach, DE;

Manfred Englert, Erlensee, DE;

Uwe Hermanns, Karlstein am Main, DE;

Inventors:

Thomas Deppisch, Aschaffenburg, DE;

Franz-Josef Helle, Rodenbach, DE;

Manfred Englert, Erlensee, DE;

Uwe Hermanns, Karlstein am Main, DE;

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C23C 14/00 (2006.01); C23C 14/56 (2006.01); H01J 37/32 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/0042 (2013.01); C23C 14/0036 (2013.01); C23C 14/0094 (2013.01); C23C 14/56 (2013.01); C23C 14/562 (2013.01); H01J 37/32935 (2013.01); H01J 37/34 (2013.01); H01J 2237/332 (2013.01);
Abstract

A method of controlling a reactive deposition process and a corresponding assembly and/or apparatus are described. The method includes providing power to a cathode with a power supply, providing a voltage set point to the power supply, receiving a power value correlating the power provided to the cathode, and controlling a flow of a process gas in dependence of the power value to provide a closed loop control for the power value.


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