The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2017
Filed:
Dec. 18, 2015
Applicant:
Dow Global Technologies Llc, Midland, MI (US);
Inventor:
John W. Kramer, Midland, MI (US);
Assignee:
DOW GLOBAL TECHNOLOGIES LLC, Midland, MI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C08F 220/18 (2006.01); C08F 224/00 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/039 (2006.01); C08F 222/10 (2006.01); C08F 220/28 (2006.01);
U.S. Cl.
CPC ...
C08F 224/00 (2013.01); C08F 220/18 (2013.01); C08F 220/28 (2013.01); C08F 222/1006 (2013.01); G03F 7/0046 (2013.01); G03F 7/039 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/2004 (2013.01); G03F 7/322 (2013.01);
Abstract
An acid-labile hyperbranched copolymer is formed by copolymerizing monomers that include a difunctional monomer and a mono(meth)acrylate ester. The difunctional monomer includes at least one formal group, acetal group, or ketal group that makes the copolymer acid-labile. The copolymer is useful as a component of a photoresist composition that provides low line width roughness, among other desirable photolithographic properties.