The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 12, 2017

Filed:

Sep. 06, 2013
Applicant:

Solvay SA, Brussels, BE;

Inventor:

Oliviero Diana, Vilvoorde, BE;

Assignee:

SOLVAY SA, Brussels, BE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23G 1/36 (2006.01); B08B 9/00 (2006.01); B08B 3/00 (2006.01); B08B 5/00 (2006.01); C23C 16/44 (2006.01); C25B 1/24 (2006.01); C25B 15/08 (2006.01);
U.S. Cl.
CPC ...
B08B 5/00 (2013.01); C23C 16/4405 (2013.01); C25B 1/245 (2013.01); C25B 15/08 (2013.01); Y02P 20/123 (2015.11);
Abstract

Elemental fluorine is often manufactured electrochemically from a solution of KF in hydrogen fluoride and contains varying amounts of HF as impurity. The present invention provides a method for chamber cleaning using Fwhich contains more than 0.1% by weight and equal to or less than 10% by weight of HF. Surprisingly, such an Fis very well suited for the purpose of chamber cleaning. In a preferred embodiment, the Fwhich contains more than 0.1% by weight and less than 2.5% by weight of HF is electrolytically produced, cleaned, delivered and used on site, without any pressurizing treatment. Omitting cleaning steps and process and using process conditions leaving a relatively high HF content in the Fallows at the same time to omit pressurizing steps. The advantage is that less cleaning steps.


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