The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 05, 2017

Filed:

Dec. 21, 2012
Applicant:

Jnc Corporation, Tokyo, JP;

Inventors:

Yoshitaka Morimoto, Chiba, JP;

Takuro Tanaka, Chiba, JP;

Koji Ohguma, Chiba, JP;

Aki Kuromatsu, Chiba, JP;

Assignee:

JNC CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 19/00 (2006.01); H05K 1/02 (2006.01); G06F 3/041 (2006.01); G06F 3/044 (2006.01); C08J 7/04 (2006.01); G02F 1/1333 (2006.01); H05K 1/03 (2006.01);
U.S. Cl.
CPC ...
H05K 1/0274 (2013.01); C08J 7/045 (2013.01); G02F 1/13338 (2013.01); G06F 3/041 (2013.01); G06F 3/044 (2013.01); H05K 1/0298 (2013.01); H05K 1/0313 (2013.01); C08J 2367/02 (2013.01); C08J 2433/04 (2013.01); G06F 2203/04103 (2013.01); H05K 2201/0108 (2013.01); H05K 2201/0323 (2013.01); H05K 2201/0326 (2013.01); Y10T 428/1055 (2015.01);
Abstract

The transparent electroconductive film is provided with: a transparent substrate formed from a film-shaped polymer resin; a first hard coat layer laminated on one surface of the substrate; and a first transparent conductor layer laminated on the upper side of the first hard coating layer. The substrate has a film thickness of 2 to 250 μm. The first hard coating layer is formed from a curable resin containing an inorganic oxide, and has a film thickness of 0.01 μm to less than 0.5 μm, or more than 6 μm to 10 μm. The first transparent conductor layer is formed from at least one material selected from the group consisting of an inorganic oxide, a metal, and carbon, has a film thickness of 10 nm to 2 μm, and is patterned so as to have formed thereon a patterned section and a non-patterned section.


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