The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2017
Filed:
Dec. 20, 2012
Applicant:
The Swatch Group Research and Development Ltd, Marin, CH;
Inventors:
Thierry Hessler, St-Aubin, CH;
Silvio Dalla Piazza, St-Imier, CH;
Assignee:
The Swatch Group Research and Development Ltd, Marin, CH;
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); H03H 9/19 (2006.01); B81C 1/00 (2006.01); G04C 3/12 (2006.01); G04F 5/06 (2006.01); G04G 17/02 (2006.01); G04B 17/06 (2006.01); G04B 17/34 (2006.01); B23K 26/00 (2014.01); F21V 17/02 (2006.01); H01L 41/047 (2006.01); H01L 41/332 (2013.01); H03H 9/215 (2006.01);
U.S. Cl.
CPC ...
H03H 9/19 (2013.01); B23K 26/0057 (2013.01); B81C 1/00595 (2013.01); F21V 17/02 (2013.01); G04B 17/066 (2013.01); G04B 17/345 (2013.01); G04C 3/12 (2013.01); G04F 5/063 (2013.01); G04G 17/02 (2013.01); H01L 41/0475 (2013.01); H01L 41/332 (2013.01); H03H 9/215 (2013.01); B81B 2201/0271 (2013.01); B81B 2203/0118 (2013.01); B81C 2201/0143 (2013.01);
Abstract
A method for manufacturing a resonator in a substrate, including: a) modifying a structure of at least one region of the substrate to make the at least one region more selective; b) etching the at least one region to selectively manufacture the resonator.