The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2017
Filed:
Feb. 29, 2016
Globalfoundries Inc., Grand Cayman, KY;
Garo Jacques Derderian, Saratoga Springs, NY (US);
GLOBALFOUNDRIES Inc., Grand Cayman, KY;
Abstract
One illustrative method disclosed herein includes, among other things, forming an original fin-formation etch mask comprised of a plurality of original line-type features and removing at least a portion of at least one of the plurality of original line-type features so as to thereby define a modified fin-formation etch mask comprising the remaining portions of the plurality of original line-type features. The method also includes forming a conformal layer of material on the remaining portions of the plurality of original line-type features of the modified fin-formation etch mask and performing at least one etching process to remove at least portions of the conformal layer of material and to define a plurality of fin-formation trenches so as to thereby initially define a plurality of fins in the substrate.