The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2017
Filed:
Jan. 30, 2015
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Asaf Schlezinger, Sunnyvale, CA (US);
Markus J. Stopper, Voerstetten, DE;
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06T 7/00 (2017.01); G06T 17/10 (2006.01); G06T 19/20 (2011.01); G06T 17/00 (2006.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); G06T 17/00 (2013.01); G06T 17/10 (2013.01); G06T 19/20 (2013.01); G06T 2207/10052 (2013.01); G06T 2207/30148 (2013.01); G06T 2219/2012 (2013.01);
Abstract
Embodiments of the present invention generally relate to methods for inspecting wafers. After a brick is sliced into a plurality of bare wafers, a two-dimensional (2D) photoluminescence (PL) image of each wafer is taken, the PL images of the wafers in sequential order (i.e., the sequence of the wafers as they are sliced from the brick) are then combined to construct a three-dimensional (3D) model of the brick that highlights similar regions in the brick.