The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2017
Filed:
May. 25, 2012
Xiaolin Xie, Wuhan, CN;
Haiyan Peng, Wuhan, CN;
Xingping Zhou, Wuhan, CN;
Chengfu Zheng, Wuhan, CN;
Hongwei GE, Wuhan, CN;
Xiaolin Xie, Wuhan, CN;
Haiyan Peng, Wuhan, CN;
Xingping Zhou, Wuhan, CN;
Chengfu Zheng, Wuhan, CN;
Hongwei Ge, Wuhan, CN;
HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY, Wuhan, CN;
Abstract
The present invention provides a visible light photoinitiating system for preparing a holographic photopolymer material with high-diffraction efficiency. The photoinitiating system comprises a photosensitizer and a co-initiator, and its mechanism is that the photosensitizer transforms from ground state to excited state after absorbing photons, and then interacts with the co-initiator through transfer of electrons and protons, which produces an alkyl (or aryl) free radical R and a ketyl radical K; wherein the free radical R initiates the addition polymerization of monomers that are capable of free radical polymerization, whereas the radical K inhibits the chain propagation of the macromolecular free radicals to a certain degree due to the steric hindrance effect, and thus delays the gelation time of the photopolymerization, which helps to increase the phase separation between the polymer and the functional components. A holographic photopolymer material with high-diffraction efficiency can be obtained by employing this visible light photoinitiating system.