The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 05, 2017

Filed:

Mar. 25, 2015
Applicant:

Samsung Display Co. Ltd., Yongin, Gyeonggi-Do, KR;

Inventors:

Su Mi Lee, Hwaseong-si, KR;

Min Hyuck Kang, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/30 (2006.01); G03F 7/00 (2006.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
G02B 5/3058 (2013.01); B82Y 40/00 (2013.01); G03F 7/0002 (2013.01); G03F 7/0005 (2013.01);
Abstract

Provided is a method of fabricating a wire grid polarizer, the method comprising an organic light-emitting display panel. According to an aspect of the present disclosure, there is provided a method comprising sequentially stacking a conductive wire pattern layer, a first neutral layer, a guide pattern layer and a second neutral layer on a substrate, forming etch-stop patterns on the second neutral layer, forming second neutral layer patterns and guide patterns by patterning the second neutral layer and the guide pattern layer using the etch-stop patterns, coating a block copolymer of two types of monomer blocks having different etch rates on the first neutral layer and the second neutral layer patterns, aligning the block copolymer, removing one type of monomer blocks from the aligned block copolymer, and patterning the conductive wire pattern layer using the remaining monomer blocks, the second neutral layer patterns, and the guide patterns.


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