The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2017
Filed:
May. 13, 2009
Jinsheng Zhou, Woodbury, MN (US);
Jonathan F. Hester, Hudson, WI (US);
Derek J. Dehn, Maplewood, MN (US);
Daniel P. Meehan, St. Paul, MN (US);
Robin E. Wright, Inver Grove Heights, MN (US);
Jinsheng Zhou, Woodbury, MN (US);
Jonathan F. Hester, Hudson, WI (US);
Derek J. Dehn, Maplewood, MN (US);
Daniel P. Meehan, St. Paul, MN (US);
Robin E. Wright, Inver Grove Heights, MN (US);
3M Innovative Properties Company, St. Paul, MN (US);
Abstract
The present disclosure provides methods for forming asymmetric membranes. More specifically, methods are provided for applying a polymerizable species to a porous substrate for forming a coated porous substrate. The coated porous substrate is exposed to an ultraviolet radiation source having a peak emission wavelength less than 340 nm to polymerize the polymerizable species forming a polymerized material retained within the porous substrate so that the concentration of polymerized material is greater at the first major surface than at the second major surface.