The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 05, 2017

Filed:

Jun. 22, 2015
Applicant:

The Procter & Gamble Company, Cincinnati, OH (US);

Inventors:

Stephen Michael Varga, Loveland, OH (US);

Bradley Edward Walsh, Cincinnati, OH (US);

Assignee:

The Procter & Gamble Company, Cincinnati, OH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); A61F 13/15 (2006.01); G02B 13/00 (2006.01); G06T 7/00 (2017.01); H04N 5/225 (2006.01); H04N 5/247 (2006.01); G06T 7/73 (2017.01); G06T 7/13 (2017.01); G06T 7/292 (2017.01);
U.S. Cl.
CPC ...
A61F 13/15772 (2013.01); G02B 13/0025 (2013.01); G06T 7/0004 (2013.01); G06T 7/13 (2017.01); G06T 7/292 (2017.01); G06T 7/73 (2017.01); G06T 7/97 (2017.01); H04N 5/2256 (2013.01); H04N 5/247 (2013.01); A61F 2013/1578 (2013.01); A61F 2013/15788 (2013.01); A61F 2013/15796 (2013.01); G06T 2207/10024 (2013.01); G06T 2207/30124 (2013.01);
Abstract

The present disclosure relates to methods and apparatuses for monitoring substrates advancing along a converting apparatus in a machine direction. The apparatus may include an analyzer connected with a line scan camera through a communication network. The analyzer may be configured as a field programmable gate array, an application specific integrated circuit, or a graphical processing unit. In addition, the line scan camera may include a linear array of pixel data and define a linear field of view, wherein the line scan camera is arranged such that the linear field of view extends in the machine direction. The apparatus may further include an illumination source that illuminates the linear field of view. In operation, the substrate is advanced in the machine direction such that a portion of the substrate advances through the linear field of view. In turn, the apparatus may be configured to perform various monitoring and/or control functions.


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