The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2017
Filed:
Feb. 13, 2014
Nec Platforms, Ltd., Kawasaki-shi, Kanagawa, JP;
Ken Miura, Kawasaki, JP;
NEC PLATFORMS, LTD., Tokyo, JP;
Abstract
Disclosed is an antenna device or the like having a split ring resonator that adapts to different frequency bands. An antenna device has a laminated structure that is composed by alternating dielectric layers (DL) () and conductor layers (CL) and that includes a plurality of structures each comprising: a first split ring (first SR) () that is formed in a first conductor layer (first CL) (A) extending along one surface of a DL (), surrounds an opening () and has a first split (first SP) () formed in a circumferential portion along the opening (); a second split ring (second SR) () that is formed in a second conductor layer (second CL) (B), which extends along the other surface of the DL (), in such a manner that the second SR () is opposed to the first SR (), the second SR () surrounding the opening () and having a second split (second SP) () formed in a circumferential portion along the opening (); a plurality of conductor vias (CVs) () that are circumferentially formed at intervals, sandwich the first SP () and second SP () and electrically connect the first SR () to the second SR (); and a feeder line () that is formed in a particular one of the CLs and has one end electrically connected to at least one of the CVs () and the other end insulated from the particular CL by a clearance () formed in the particular CL along the extending direction of the particular CL.