The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2017
Filed:
Feb. 25, 2016
Applicant:
Globalfoundries Inc., Grand Cayman, KY;
Inventors:
Yanzhen Wang, Clifton Park, NY (US);
Jidong Huang, Rexford, NY (US);
Hui Zang, Guilderland, NY (US);
Assignee:
GLOBALFOUNDRIES INC., Grand Cayman, KY;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/283 (2006.01); H01L 29/78 (2006.01); H01L 29/66 (2006.01); H01L 29/06 (2006.01); H01L 21/285 (2006.01); H01L 21/28 (2006.01); H01L 29/49 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7851 (2013.01); H01L 21/28008 (2013.01); H01L 21/2855 (2013.01); H01L 29/0649 (2013.01); H01L 29/495 (2013.01); H01L 29/4966 (2013.01); H01L 29/66795 (2013.01);
Abstract
An angled gas cluster ion beam is used for each sidewall and top of a fin (two applications) to form work-function metal layer(s) only on the sidewalls and top of each fin.
Wang, Yanzhen. (2017). Formation of work-function layers for gate electrode using a gas cluster ion beam (U.S. Patent No. 9748392). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9748392
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile