The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2017
Filed:
Mar. 08, 2013
Applicant:
Cardinal CG Company, Eden Prairie, MN (US);
Inventors:
John R. German, Prairie du Sac, WI (US);
Klaus H. W. Hartig, Avoca, WI (US);
Assignee:
Cardinal CG Company, Eden Praire, MN (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/00 (2006.01); H01J 37/34 (2006.01); C23C 14/35 (2006.01); C23C 14/34 (2006.01); C23C 14/56 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3452 (2013.01); C23C 14/3407 (2013.01); C23C 14/35 (2013.01); C23C 14/352 (2013.01); H01J 37/3405 (2013.01); H01J 37/347 (2013.01); C23C 14/562 (2013.01); H01J 2237/334 (2013.01);
Abstract
A cathode target assembly for use in sputtering target material onto a substrate includes a generally cylindrical target and a magnetic array. The magnetic array is adapted to provide a plasma confinement region adjacent an outer surface of the target. End portions of the magnetic array are adapted to make the shape and strength of the confinement field at the turns of the racetrack closely match the shape and strength of the confinement field along the straight part of the racetrack so as to significantly reduce cross-corner effect.