The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 2017
Filed:
May. 02, 2014
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventor:
Jianping Zou, Austin, TX (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05B 13/02 (2006.01); G05B 17/02 (2006.01); H04L 29/08 (2006.01);
U.S. Cl.
CPC ...
G05B 17/02 (2013.01); H04L 67/10 (2013.01);
Abstract
A system and method for reducing pilot runs of run-to-run control in a manufacturing facility calculates an unbiased estimation of an independent model intercept based on a state space model associated with the manufacturing facility. A determination is made as to whether to perform a pilot run in the manufacturing facility. Upon determining that the run is to be performed, an indication that the pilot run is to be performed is generated. Pilot run data is received in response to the pilot run being performed, and the state space model is updated based on the received data.