The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 29, 2017

Filed:

Apr. 10, 2015
Applicant:

Konica Minolta, Inc., Tokyo, JP;

Inventors:

Satoshi Uchino, Hino, JP;

Kosuke Nakamura, Hachioji, JP;

Futoshi Kadonome, Hachioji, JP;

Koji Shibata, Hachioji, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03G 13/08 (2006.01); G03G 21/00 (2006.01); G03G 9/087 (2006.01); G03G 9/097 (2006.01);
U.S. Cl.
CPC ...
G03G 21/0094 (2013.01); G03G 9/08724 (2013.01); G03G 9/08755 (2013.01); G03G 9/08773 (2013.01); G03G 9/09716 (2013.01); G03G 9/09725 (2013.01);
Abstract

A process of forming an image includes the steps of: developing an electrostatic latent image with a toner, the latent image being formed through charge of the surface of an electrostatic latent image carrier and exposure of the surface to light; and applying a lubricant onto the surface of the electrostatic latent image carrier. The toner includes a toner matrix particle and an external additive nanoparticle. The external additive nanoparticle comprises a silica-polymer composite nanoparticle. A percentage of atomic silicon present on the surface of the silica-polymer composite nanoparticle satisfies Condition A expressed by Expression: 15.0 atm %≦percentage of atomic silicon ({Si/(C+O+Si)}×100)≦30.0 atm %. The percentage of atomic silicon is determined from total amounts of atomic carbon, oxygen, and silicon present on the topmost surface of the silica-polymer composite nanoparticle and within 3 nm inwards from the topmost surface.


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