The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 29, 2017

Filed:

Feb. 21, 2016
Applicants:

Brad Kimbrough, Tucson, AZ (US);

Erik Novak, Tucson, AZ (US);

Inventors:

Brad Kimbrough, Tucson, AZ (US);

Erik Novak, Tucson, AZ (US);

Assignee:

4D TECHNOLOGY CORPORATION, Tucson, AZ (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/02 (2006.01); G01B 11/24 (2006.01);
U.S. Cl.
CPC ...
G01B 11/2441 (2013.01);
Abstract

A substrate is tested with an interferometer in-line in a roll-to-roll processing operation to detect defects and exclude them from further processing. A tilt is introduced in the illumination path of the interferometer to allow detection of best fringes in a selected measurement field of view (FOV) that is smaller than the camera FOV in the direction transverse to the fringes. At each acquisition frame, the measurement FOV is shifted to track the best-fringe position within the camera field of view based on irradiance acquired at the previous step. As a result, the system is able to accommodate substrate flutter and roller runout and maintain focus on the substrate that allows precise identification of defects and their isolation for subsequent processing.


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