The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 29, 2017

Filed:

Aug. 17, 2012
Applicants:

Dong-mok Shin, Daejeon, KR;

Na-ri Kim, Seoul, KR;

Byeong-in Ahn, Daejeon, KR;

Sang-soon Choi, Daejeon, KR;

Young-ji Tae, Gwacheon-si, KR;

Keong-yeon Yoon, Daejeon, KR;

Inventors:

Dong-Mok Shin, Daejeon, KR;

Na-Ri Kim, Seoul, KR;

Byeong-In Ahn, Daejeon, KR;

Sang-Soon Choi, Daejeon, KR;

Young-Ji Tae, Gwacheon-si, KR;

Keong-Yeon Yoon, Daejeon, KR;

Assignee:

LG CHEM, LTD., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 75/04 (2006.01); C08L 71/02 (2006.01); C08G 101/00 (2006.01);
U.S. Cl.
CPC ...
C08L 75/04 (2013.01); C08G 2101/005 (2013.01);
Abstract

The present invention relates to a polyurethane resin composition for a support pad including a polyurethane resin, a DMF solvent, an anionic surfactant, and polyethylene glycol (PEG), and a polyurethane support pad including the polyurethane resin composition for a support pad. According to the present invention, long and large pores may be uniformly formed therein, and thus a support pad having an excellent compression rate and compression recovery rate may be provided.


Find Patent Forward Citations

Loading…