The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 22, 2017

Filed:

Apr. 08, 2015
Applicant:

The Trustees of Columbia University IN the City of New York, New York, NY (US);

Inventors:

Kenneth L. Shepard, Ossining, NY (US);

Jacob Rosenstein, New York, NY (US);

Ryan Michael Field, New York, NY (US);

Dan Fleischer, New York, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/808 (2006.01); H01L 29/06 (2006.01); H01L 21/762 (2006.01); H01L 21/8232 (2006.01); H01L 27/098 (2006.01); H01L 29/423 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 29/808 (2013.01); H01L 21/762 (2013.01); H01L 21/8232 (2013.01); H01L 27/098 (2013.01); H01L 29/0696 (2013.01); H01L 29/42316 (2013.01); H01L 29/66893 (2013.01); H01L 29/0649 (2013.01);
Abstract

A complementary metal oxide semiconductor (CMOS)-integrated junction field effect transistor (JFET) has reduced scale and reduced noise. An exemplary JFET has a substrate layer of one dopant type with a gate layer of that dopant type disposed on the substrate, a depletion channel of a second dopant type disposed on the first gate layer, and a second gate layer of the first dopant type disposed on the depletion channel and proximate a surface of the transistor. The second gate layer can separate the depletion channel from the surface, and the depletion channel separates the first gate layer from the second gate layer.


Find Patent Forward Citations

Loading…