The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 22, 2017

Filed:

Sep. 06, 2016
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Masayuki Terai, Suwon-si, KR;

Gwan-hyeob Koh, Seoul, KR;

Dae-hwan Kang, Seoul, KR;

Assignee:

SAMSUNG ELECTRONICS CO., LTD., Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/00 (2006.01); H01L 27/24 (2006.01); H01L 45/00 (2006.01); H01L 27/11582 (2017.01); H01L 27/10 (2006.01); G11C 13/00 (2006.01); H01L 27/06 (2006.01);
U.S. Cl.
CPC ...
H01L 27/2427 (2013.01); G11C 13/0002 (2013.01); H01L 27/0688 (2013.01); H01L 27/101 (2013.01); H01L 27/11582 (2013.01); H01L 27/249 (2013.01); H01L 27/2445 (2013.01); H01L 27/2454 (2013.01); H01L 27/2481 (2013.01); H01L 45/126 (2013.01); H01L 45/1233 (2013.01); G11C 2213/17 (2013.01); G11C 2213/79 (2013.01);
Abstract

A memory device may include a substrate, a first conductive line on the substrate and extending in a first direction, a second conductive line over the first conductive line and extending in a second direction crossing the first direction, a third conductive line over the second conductive line and extending in the first direction, a first memory cell at an intersection of the first conductive line and the second conductive line and including a first selection element layer and a first variable resistance layer, and a second memory cell at an intersection of the second conductive line and the third conductive line and including a second selection element layer and a second variable resistance layer. A first height of the first selection element layer in a third direction perpendicular to the first and second directions is different than a second height of the second selection element layer in the third direction.


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