The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 22, 2017

Filed:

Nov. 02, 2012
Applicants:

Katsumi Hashimoto, Kyoto, JP;

Manabu Nakanishi, Kyoto, JP;

Takashi Matsushita, Kyoto, JP;

Inventors:

Katsumi Hashimoto, Kyoto, JP;

Manabu Nakanishi, Kyoto, JP;

Takashi Matsushita, Kyoto, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F25B 29/00 (2006.01); F27D 9/00 (2006.01); H01L 21/67 (2006.01); F27B 17/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67109 (2013.01); F27B 17/0025 (2013.01);
Abstract

Each of substrates which are sequentially loaded into an apparatus is transferred to one of empty (available) cooling units, and the cooling unit is reserved as a unit to be used for performing a cooling treatment after a post-exposure bake process for the substrate and the reservation information is stored. After one of the cooling units is reserved in advance before the post-exposure bake process, the substrate is transferred from the cooling unit to one of heating units without being subjected to a cooling treatment and is subjected to a post-exposure bake process therein. After the post-exposure bake process, the substrate is transferred from the heating unit to the reserved cooling unit which is reserved in advance and subjected to a cooling treatment therein.


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