The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2017
Filed:
Jun. 29, 2016
Institute of Nuclear Energy Research, Atomic Energy Council, Executive Yuan, R.o.c., Taoyuan, TW;
Hsin-Liang Chen, Pingtung County, TW;
Cheng-Chang Hsieh, Chiayi, TW;
Deng-Lain Lin, Taoyuan, TW;
Ching-Pei Tseng, Taoyuan, TW;
Ming-Chung Yang, Taoyuan, TW;
Abstract
A high frequency plasma apparatus includes a reaction chamber, a first electrode, a second electrode, and a plurality of feed points located at one of the two electrodes at least. The feed points are used to simultaneously generate a first standing wave and a second standing wave, with different temporal and spatial patterns. By adjusting amplitudes of the two standing waves and the temporal and spatial phase differences between the two standing waves appropriately, plasma uniformity of the high frequency plasma apparatus can be effectively improved.