The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 22, 2017

Filed:

Mar. 30, 2016
Applicant:

Yoon-sung Han, Seoul, KR;

Inventor:

Yoon-sung Han, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/22 (2006.01); G11C 11/16 (2006.01); G11C 5/06 (2006.01); H01L 43/02 (2006.01); H01L 43/08 (2006.01); H01L 43/12 (2006.01); H01L 23/528 (2006.01); H01L 23/522 (2006.01);
U.S. Cl.
CPC ...
G11C 11/161 (2013.01); G11C 5/06 (2013.01); G11C 11/1673 (2013.01); H01L 23/528 (2013.01); H01L 27/222 (2013.01); H01L 27/228 (2013.01); H01L 43/02 (2013.01); H01L 43/08 (2013.01); H01L 43/12 (2013.01); H01L 23/5228 (2013.01);
Abstract

Disclosed are a magnetic device and a method of manufacturing the same. The magnetic device includes an insulation spacer that surrounds a portion of a wiring structure and a variable resistance structure. In order to manufacture the magnetic device, a magnetic resistance element and an electrode covering the magnetic resistance element are formed on a substrate by using a sacrificial mask pattern as an etch mask, and then, an insulation spacer that surrounds the magnetic resistance element, the electrode, and the sacrificial mask pattern and exposes the sacrificial mask pattern is formed. A contact space that is limited by the insulation spacer and exposes the electrode is provided by removing the sacrificial mask pattern. A conductive pattern contacting the electrode is formed in the contact space.


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