The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2017
Filed:
Mar. 30, 2016
Applicant:
Sumitomo Chemical Company, Limited, Tokyo, JP;
Inventors:
Masako Sugihara, Osaka, JP;
Junji Nakanishi, Osaka, JP;
Assignee:
SUMITOMO CHEMICAL COMPANY, LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/30 (2006.01); G03F 7/039 (2006.01); G03F 7/075 (2006.01); G03F 7/085 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/0751 (2013.01); G03F 7/085 (2013.01); G03F 7/30 (2013.01);
Abstract
A resist composition contains: a resin having an acid-labile group, an acid generator, a compound having two or more phenolic-hydroxy groups and being other than a resin, and a solvent. The resist composition of the disclosure can provide a resist pattern showing excellent shape and detachability, therefore, the present resist composition can be used for semiconductor microfabrication with resist patterns showing excellent shape.