The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2017
Filed:
Jul. 24, 2013
Csem Centre Suisse D'electronique ET DE Microtechnique Sa-recherche ET Developpment, Neuchatel, CH;
Omar Sqalli, Munich, DE;
David Pires, Allschwil, CH;
Guillaume Basset, Huningue, FR;
Martin Stalder, Oberwil, CH;
Abstract
The present invention concerns a method for constructing a light coupling system wherein a grating is manufactured on the surface of a multimode waveguide and defines the entrance of the waveguide for an incident light beam, said grating comprising a repetition of patterns. The grating is defined by a set of parameters comprising: •grating period (P), separating two adjacent patterns, •grating depth (d) between the highest and the lowest point of the pattern, •incident angle mean value (θ) of the incident light with respect to the waveguide. The method comprises a step of optimization of the set of parameters to obtain an optimized second set of parameters, in order to obtain a transmission efficiency (Ce) of the incident light into said waveguide for the first or the second diffractive order exceeding 35% for unpolarized light, or exceeding 50% for polarized light, at a given wavelength of the incident light.