The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2017
Filed:
Jan. 30, 2014
Applicant:
Commissariat a L'energie Atomique ET Aux Energies Alternatives, Paris, FR;
Inventors:
Samy Strola, Grenoble, FR;
Cedric Allier, Grenoble, FR;
Mathieu Dupoy, Grenoble, FR;
Emmanuelle Schultz, Saint Egreve, FR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/02 (2006.01); G01N 21/00 (2006.01); G01N 33/00 (2006.01); G01N 21/65 (2006.01); G01N 21/01 (2006.01); G01N 21/13 (2006.01); G03H 1/04 (2006.01);
U.S. Cl.
CPC ...
G01N 21/65 (2013.01); G01N 21/01 (2013.01); G01N 21/13 (2013.01); G03H 1/0443 (2013.01); G01N 2021/135 (2013.01); G03H 2001/045 (2013.01); G03H 2001/0447 (2013.01);
Abstract
A method for regulating the relative position of an analyte of a sample () in relation to a light beam (F) includes the illumination of the analyte of the sample () with the light beam (F), capturing by an imaging device () a transmission image of the beams scattered by the analyte of the sample () in order to establish a diffraction pattern, and modifying the relative position of the analyte of the sample () in relation to the light beam (F) according to at least one property of the diffraction pattern.