logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9738970 B1

PDFFull Text
Date of Patent:
Aug. 22, 2017

Filed:

Sep. 11, 2014

Microwave plasma reactors and substrates for synthetic diamond manufacture

Applicant:

Element Six Limited, Ballasalla, IM;

Inventors:

Carlton Nigel Dodge, Ballasalla, GB;

Paul Nicolas Inglis, Ascot, GB;

Geoffrey Alan Scarsbrook, Ascot, GB;

Timothy Peter Mollart, Ascot, GB;

Charles Simon James Pickles, Ascot, GB;

Steven Edward Coe, Ascot, GB;

Joseph Michael Dodson, Ascot, GB;

Alexander Lamb Cullen, Ascot, GB;

John Robert Brandon, Ascot, GB;

Christopher John Howard Wort, Ascot, GB;

Assignee:

Element Six Limited, Ballasalla, IM;

Attorneys:

Dean W. Russell

Clark F. Weight

Kilpatrick Townsend & Stockton LLP

Primary Examiner:

Laura Auer

Int. Cl.
CPC ...
C23C 16/27 (2006.01); C23C 16/511 (2006.01); C23C 16/458 (2006.01); C30B 25/10 (2006.01); C30B 29/04 (2006.01); H01J 37/32 (2006.01); C23C 16/52 (2006.01); C01B 31/06 (2006.01); C23C 16/56 (2006.01);
U.S. Cl.
CPC ...
C23C 16/274 (2013.01); C01B 31/06 (2013.01); C23C 16/4586 (2013.01); C23C 16/511 (2013.01); C23C 16/52 (2013.01); C23C 16/56 (2013.01); C30B 25/105 (2013.01); C30B 29/04 (2013.01); H01J 37/32192 (2013.01); H01J 37/32284 (2013.01); Y10T 428/12993 (2015.01);
Abstract

The present disclosure relates to substrates for use in microwave plasma reactors. Certain substrates include a cylindrical disc of a carbide forming refractory metal having a flat growth surface on which CVD diamond is to be grown and a flat supporting surface opposed to said growth surface. The cylindrical disc may have a diameter of 80 mm or more. The growth surface may have a flatness variation no more than 100 mm The supporting surface may have a flatness variation no more than 100 mm.

Find Patent Forward Citations

Dodge, Carlton. (2017). Microwave plasma reactors and substrates for synthetic diamond manufacture (U.S. Patent No. 9738970). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9738970

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…