The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 22, 2017

Filed:

Sep. 11, 2014
Applicant:

Element Six Limited, Ballasalla, IM;

Inventors:
Assignee:

Element Six Limited, Ballasalla, IM;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/27 (2006.01); C23C 16/511 (2006.01); C23C 16/458 (2006.01); C30B 25/10 (2006.01); C30B 29/04 (2006.01); H01J 37/32 (2006.01); C23C 16/52 (2006.01); C01B 31/06 (2006.01); C23C 16/56 (2006.01);
U.S. Cl.
CPC ...
C23C 16/274 (2013.01); C01B 31/06 (2013.01); C23C 16/4586 (2013.01); C23C 16/511 (2013.01); C23C 16/52 (2013.01); C23C 16/56 (2013.01); C30B 25/105 (2013.01); C30B 29/04 (2013.01); H01J 37/32192 (2013.01); H01J 37/32284 (2013.01); Y10T 428/12993 (2015.01);
Abstract

The present disclosure relates to substrates for use in microwave plasma reactors. Certain substrates include a cylindrical disc of a carbide forming refractory metal having a flat growth surface on which CVD diamond is to be grown and a flat supporting surface opposed to said growth surface. The cylindrical disc may have a diameter of 80 mm or more. The growth surface may have a flatness variation no more than 100 mm The supporting surface may have a flatness variation no more than 100 mm.


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