The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2017
Filed:
Sep. 03, 2015
Applicant:
Northwestern University, Evanston, IL (US);
Inventors:
Franz M. Geiger, Evanston, IL (US);
Danielle Faurie-Wisniewski, San Antonio, TX (US);
Assignee:
Northwestern University, Evanston, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/30 (2006.01); C23C 14/14 (2006.01);
U.S. Cl.
CPC ...
C23C 14/30 (2013.01); C23C 14/14 (2013.01);
Abstract
Methods of forming chemically pure metal films are provided. The methods use electron beam deposition at a high mean deposition rate to form high purity metal films on deposition substrates. By using a high mean deposition rate, the melting point of the metal to be deposited is reached at the metal source surface during the deposition. As a result, the rate of transfer of impurities present in the metal source to the surface of the deposition substrate is so small that the deposited metal films are substantially free of impurity elements.