The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2017
Filed:
May. 24, 2016
Canon Kabushiki Kaisha, Tokyo, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
A pattern of a first ink is formed on a recording medium using a first nozzle, a difference between smoothness of a surface at an edge portion of the pattern of the first ink in a predetermined direction and smoothness of a peripheral area of the pattern of the first ink on the recording medium is increased by applying another imparting material different from the first ink on the pattern of the first ink and a first adjustment pattern is formed, a second adjustment pattern of a predetermined imparting material is formed on the recording medium using a second nozzle, and a detection unit detects information by measuring specular reflected light when areas respectively including the first and the second adjustment patterns are each irradiated with light.