The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2017
Filed:
Oct. 17, 2007
Yves-alban Duclos, Octeville sur Mer, FR;
Laurent Danel, Octeville sur Mer, FR;
Naima Boutroix, Octeville sur Mer, FR;
Yves-Alban Duclos, Octeville sur Mer, FR;
Laurent Danel, Octeville sur Mer, FR;
Naima Boutroix, Octeville sur Mer, FR;
SIDEL PARTICIPATIONS, Octeville sur Mer, FR;
Abstract
Machine () for the plasma treatment of containers (), which comprises: a chamber () suitable for receiving a container () to be treated, a cover () defining a nozzle () in the extension of the chamber (); a duct () for depressurization the container (), which duct opens into the nozzle () and connects the latter to a vacuum source (); a first valve () having a closed position, in which it closes off the depressurization duct (), and an open position, in which it brings the nozzle () and the vacuum source () into communication; a duct () for pressurizing the container (), separate from the depressurization duct (), this pressurization duct () emerging in the nozzle () beyond the depressurization duct () and connecting the nozzle () to a pressure source (); and a second valve () having a closed position, in which it closes off the pressurization duct (), and an open position, in which it brings the nozzle () and the pressure source () into communication.