The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 22, 2017

Filed:

Aug. 07, 2014
Applicant:

Nobel Biocare Services Ag, Glattbrugg, CH;

Inventor:

Jan Hall, Gothenburg, SE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61C 13/00 (2006.01); A61F 2/00 (2006.01); A61B 17/86 (2006.01); A61C 8/00 (2006.01); A61L 27/30 (2006.01); A61F 2/28 (2006.01); A61F 2/30 (2006.01);
U.S. Cl.
CPC ...
A61F 2/0077 (2013.01); A61B 17/866 (2013.01); A61C 8/0018 (2013.01); A61F 2/2803 (2013.01); A61F 2/30771 (2013.01); A61F 2/30942 (2013.01); A61L 27/30 (2013.01); A61C 2008/0046 (2013.01); A61F 2/3094 (2013.01); A61F 2/30767 (2013.01); A61F 2002/2817 (2013.01); A61F 2002/30004 (2013.01); A61F 2002/3085 (2013.01); A61F 2002/3097 (2013.01); A61F 2002/30322 (2013.01); A61F 2002/30866 (2013.01); A61F 2002/30924 (2013.01); A61F 2002/30925 (2013.01); A61F 2002/30953 (2013.01); A61F 2240/002 (2013.01); A61F 2250/0014 (2013.01); A61F 2250/0026 (2013.01); A61F 2310/00598 (2013.01); A61F 2310/00616 (2013.01); Y10T 29/5191 (2015.01);
Abstract

In a method and system for producing an implant, the latter is designed with one or more surfaces extending in the longitudinal direction of the implant. Two or three production stages can be used. In one stage, either a topography with a long wave pattern is produced by means of cutting work, or laser bombardment or further cutting work is used to produce a topography with an intermediate-length wave pattern. In addition, an oxidation process or shot-peening or etching is used to produce an outer layer. When using two of said production stages, said cutting work or said laser bombardment or further cutting work is followed by the oxidation process or the shot-peening or etching method. When using all three production stages, cutting work is followed by laser bombardment, or further cutting work, which in turn is followed for example by the oxidation process. The invention also relates to an implant which is produced using the method and is identified, ordered and produced using the system. The invention permits effective treatment of different implant situations.


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