The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 15, 2017

Filed:

Oct. 11, 2013
Applicant:

Cypress Semiconductor Corporation, San Jose, CA (US);

Inventors:

Gong Chen, San Jose, CA (US);

Scott Bell, San Jose, CA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/788 (2006.01); H01L 21/28 (2006.01); H01L 21/336 (2006.01); H01L 29/792 (2006.01); H01L 21/033 (2006.01); H01L 21/311 (2006.01); H01L 21/3213 (2006.01); H01L 29/423 (2006.01); H01L 29/66 (2006.01); H01L 21/3215 (2006.01);
U.S. Cl.
CPC ...
H01L 29/792 (2013.01); H01L 21/0337 (2013.01); H01L 21/28282 (2013.01); H01L 21/31144 (2013.01); H01L 21/32137 (2013.01); H01L 29/42344 (2013.01); H01L 29/66833 (2013.01); H01L 21/32155 (2013.01);
Abstract

Disclosed herein is a semiconductor device including a first dielectric disposed over a channel region of a transistor formed in a substrate and a gate disposed over the first dielectric. The semiconductor device further includes a second dielectric disposed vertically, substantially perpendicular to the substrate, at an edge of the gate, and a spacer disposed proximate to the second dielectric. The spacer includes a cross-section with a perimeter that includes a top curved portion and a vertical portion that is substantially perpendicular to the substrate. Further, disclosed herein, are methods associated with the fabrication of the aforementioned semiconductor device.


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