The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 15, 2017

Filed:

Apr. 15, 2014
Applicant:

Semiconductor Components Industries, Llc, Phoenix, AZ (US);

Inventors:

Tetsuro Asano, Ora-gun, JP;

Mikito Sakakibara, Kumagaya, JP;

Toshikazu Hirai, Ora-gun, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/02 (2006.01); H01L 23/00 (2006.01); H01L 29/80 (2006.01); H01L 29/812 (2006.01); H01L 29/861 (2006.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0255 (2013.01); H01L 24/48 (2013.01); H01L 27/0248 (2013.01); H01L 27/0288 (2013.01); H01L 29/66098 (2013.01); H01L 29/80 (2013.01); H01L 29/812 (2013.01); H01L 29/861 (2013.01);
Abstract

With a microwave FET, an incorporated Schottky junction capacitance or PN junction capacitance is small and such a junction is weak against static electricity. However, with a microwave device, the method of connecting a protecting diode cannot be used since this method increases the parasitic capacitance and causes degradation of the high-frequency characteristics. In order to solve the above problems, a protecting element, having a first n-type region—insulating region—second n-type region arrangement is connected in parallel between two terminals of a protected element having a PN junction, Schottky junction, or capacitor. Since discharge can be performed between the first and second nregions that are adjacent each other, electrostatic energy that would reach the operating region of an FET can be attenuated without increasing the parasitic capacitance.


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